Remote Plasma Atomic Layer Deposition Apparatus and Method Using Dc Bias HT Jeon, UJ Kim, J Kim, J Kim US Patent App. 11/658,961, 2009 | 285 | 2009 |
Morphology and phase stability of TiSi2 on Si H Jeon, CA Sukow, JW Honeycutt, GA Rozgonyi, RJ Nemanich Journal of applied physics 71 (9), 4269-4276, 1992 | 283 | 1992 |
Apparatus for generating remote plasma HT Jeon, IH Kim, SH Kim, CW Chung, SK Lee US Patent App. 11/703,621, 2007 | 211 | 2007 |
Characteristics of the ZnO thin film transistor by atomic layer deposition at various temperatures S Kwon, S Bang, S Lee, S Jeon, W Jeong, H Kim, SC Gong, HJ Chang, ... Semiconductor science and technology 24 (3), 035015, 2009 | 156 | 2009 |
Formation of nanocrystalline Fe–Co powders produced by mechanical alloying Y Do Kim, JY Chung, J Kim, H Jeon Materials Science and Engineering: A 291 (1-2), 17-21, 2000 | 155 | 2000 |
Apparatus for generating remote plasma HT Jeon, S Woo, HC Kim, CW Chung US Patent 8,207,470, 2012 | 145 | 2012 |
History of atomic layer deposition and its relationship with the American Vacuum Society GN Parsons, JW Elam, SM George, S Haukka, H Jeon, M Leskelä, ... Journal of Vacuum Science & Technology A 31 (5), 2013 | 136 | 2013 |
Atomic layer deposition and biocompatibility of titanium nitride nano-coatings on cellulose fiber substrates GK Hyde, SD McCullen, S Jeon, SM Stewart, H Jeon, EG Loboa, ... Biomedical materials 4 (2), 025001, 2009 | 131 | 2009 |
Tuning the electronic structure of tin sulfides grown by atomic layer deposition G Ham, S Shin, J Park, H Choi, J Kim, YA Lee, H Seo, H Jeon ACS Applied Materials & Interfaces 5 (18), 8889-8896, 2013 | 110 | 2013 |
Characteristics of HfO2 thin films grown by plasma atomic layer deposition J Kim, S Kim, H Jeon, MH Cho, KB Chung, C Bae Applied Physics Letters 87 (5), 2005 | 107 | 2005 |
Structural and electrical properties of ZnO thin films deposited by atomic layer deposition at low temperatures S Jeon, S Bang, S Lee, S Kwon, W Jeong, H Jeon, HJ Chang, HH Park Journal of the Electrochemical Society 155 (10), H738, 2008 | 105 | 2008 |
Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor JY Kim, S Seo, DY Kim, H Jeon, Y Kim Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 22 (1 …, 2004 | 105 | 2004 |
Photocurrent detection of chemically tuned hierarchical ZnO nanostructures grown on seed layers formed by atomic layer deposition S Bang, S Lee, Y Ko, J Park, S Shin, H Seo, H Jeon Nanoscale research letters 7, 1-11, 2012 | 104 | 2012 |
Microstructure and magnetic properties of nanosized Fe–Co alloy powders synthesized by mechanochemical and mechanical alloying process BH Lee, BS Ahn, DG Kim, ST Oh, H Jeon, J Ahn, Y Do Kim Materials Letters 57 (5-6), 1103-1107, 2003 | 104 | 2003 |
A study on H2 plasma treatment effect on a-IGZO thin film transistor J Kim, S Bang, S Lee, S Shin, J Park, H Seo, H Jeon Journal of Materials Research 27 (17), 2318-2325, 2012 | 97 | 2012 |
Study on the characteristics of TiN thin film deposited by the atomic layer chemical vapor deposition method H Jeon, JW Lee, YD Kim, DS Kim, KS Yi Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (4 …, 2000 | 96 | 2000 |
Hydrogen-reduction behavior and microstructural characteristics of WO3–CuO powder mixtures with various milling time DG Kim, ST Oh, H Jeon, CH Lee, Y Do Kim Journal of alloys and compounds 354 (1-2), 239-242, 2003 | 95 | 2003 |
Characteristics of ZrO2 gate dielectric deposited using Zr t–butoxide and Zr (NEt2) 4 precursors by plasma enhanced atomic layer deposition method Y Kim, J Koo, J Han, S Choi, H Jeon, CG Park Journal of applied physics 92 (9), 5443-5447, 2002 | 91 | 2002 |
Ultrathin alumina-coated carbon nanotubes as an anode for high capacity Li-ion batteries I Lahiri, SM Oh, JY Hwang, C Kang, M Choi, H Jeon, R Banerjee, YK Sun, ... Journal of Materials Chemistry 21 (35), 13621-13626, 2011 | 83 | 2011 |
Fabrication of high crystalline SnS and SnS2 thin films, and their switching device characteristics H Choi, J Lee, S Shin, J Lee, S Lee, H Park, S Kwon, N Lee, M Bang, ... Nanotechnology 29 (21), 215201, 2018 | 76 | 2018 |