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Vadthiya Narendar
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Analytical modeling and simulation of multigate FinFET devices and the impact of high-k dielectrics on short channel effects (SCEs)
V Narendar, RA Mishra
Superlattices and Microstructures 85, 357-369, 2015
1252015
Design insights of nanosheet FET and CMOS circuit applications at 5-nm technology node
VB Sreenivasulu, V Narendar
IEEE Transactions on Electron Devices 69 (8), 4115-4122, 2022
732022
Characterization and optimization of junctionless gate-all-around vertically stacked nanowire FETs for sub-5 nm technology nodes
VB Sreenivasulu, V Narendar
Microelectronics Journal 116, 105214, 2021
602021
A comprehensive analysis of junctionless tri-gate (TG) FinFET towards low-power and high-frequency applications at 5-nm gate length
VB Sreenivasulu, V Narendar
Silicon, 1-13, 2021
562021
Design and temperature assessment of junctionless nanosheet fet for nanoscale applications
VB Sreenivasulu, V Narendar
Silicon 14 (8), 3823-3834, 2021
512021
Surface potential modeling of graded-channel gate-stack (GCGS) high-K dielectric dual-material double-gate (DMDG) MOSFET and analog/RF performance study
V Narendar, KA Girdhardas
silicon 10, 2865-2875, 2018
462018
Design and Deep Insights into Sub-10 nm Spacer Engineered Junctionless FinFET for Nanoscale Applications
B Sreenivasulu V., V Narendar
ECS Journal of Solid State Science and Technology 10 (1), 013008, 2021
412021
Junctionless SOI FinFET with advanced spacer techniques for sub-3 nm technology nodes
VB Sreenivasulu, V Narendar
AEU-International Journal of Electronics and Communications 145, 154069, 2022
402022
Performance improvement of spacer engineered n-type SOI FinFET at 3-nm gate length
VB Sreenivasulu, V Narendar
AEU-International Journal of Electronics and Communications 137, 153803, 2021
402021
Design insights into RF/analog and linearity/distortion of spacer engineered multi‐fin SOI FET for terahertz applications
VB Sreenivasulu, V Narendar
International Journal of RF and Microwave Computer‐Aided Engineering 31 (12 …, 2021
362021
Performance enhancement of FinFET devices with gate-stack (GS) high-K dielectrics for Nanoscale applications
V Narendar
Silicon 10 (6), 2419-2429, 2018
322018
Design of high-performance digital logic circuits based on FinFET technology
V Narendar, S Rai, RA Mishra
International Journal of Computer Applications 41 (20), 2012
312012
Circuit analysis and optimization of GAA nanowire FET towards low power and high switching
VB Sreenivasulu, V Narendar
Silicon 14 (16), 10401-10411, 2022
272022
Junctionless gate-all-around nanowire FET with asymmetric spacer for continued scaling
VB Sreenivasulu, V Narendar
Silicon, 1-11, 2021
272021
Investigation of short channel effects (SCEs) and analog/RF figure of merits (FOMs) of dual-material bottom-spacer ground-plane (DMBSGP) FinFET
V Narendar, P Narware, V Bheemudu, B Sunitha
Silicon 12, 2283-2291, 2020
262020
A two-dimensional (2D) analytical surface potential and subthreshold current model for the underlap dual-material double-gate (DMDG) FinFET
V Narendar, S Rai, S Tiwari
Journal of Computational Electronics 15, 1316-1325, 2016
252016
A three-dimensional (3D) analytical model for subthreshold characteristics of uniformly doped FinFET
S Tripathi, V Narendar
Superlattices and Microstructures 83, 476-487, 2015
252015
p-Type trigate junctionless nanosheet MOSFET: analog/RF, linearity, and circuit analysis
BS Vakkalakula, N Vadthiya
ECS Journal of Solid State Science and Technology 10 (12), 123001, 2021
242021
A two-dimensional (2D) analytical modeling and improved Short Channel performance of Graded-Channel gate-stack (GCGS) dual-material double-gate (DMDG) MOSFET
N Vadthiya, S Tripathi, RBS Naik
Silicon 10, 2399-2407, 2018
242018
A novel bottom-spacer ground-plane (BSGP) FinFET for improved logic and analog/RF performance
N Vadthiya, P Narware, V Bheemudu, B Sunitha
AEU-International Journal of Electronics and Communications 127, 153459, 2020
202020
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